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03 Contract Award Notice - Successful Supplier(s)

ICP ETCH

  • First published: 05 December 2016
  • Last modified: 05 December 2016
  • Version: N/A
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The buyer is not using this website to administer the notice.

To record your interest or obtain additional information or documents please find instructions within the Full Notice Text. (NOTE: Contract Award Notices and Prior Information Notices do not normally require a response)

Contents

Summary

OCID:
ocds-kuma6s-051973
Published by:
Cardiff University
Authority ID:
AA0258
Publication date:
05 December 2016
Deadline date:
-
Notice type:
03 Contract Award Notice - Successful Supplier(s)
Has documents:
No
Has SPD:
No
Has Carbon Reduction Plan:
N/A

Abstract

The Inductively Coupled Plasma Reactive Ion Etch machine is a specialist semiconductor cleanroom processing tool for dry etching of samples of semiconductor, polymer or metal in a high -vacuum chamber using gas. High purity reactive gas plasmas, are generated in the vacuum chamber which react with the material on the surface of the sample to etch it away. CPV: 22520000.

Full notice text

Contract award notice

Results of the procurement procedure

Section I: Contracting authority

I.1) Name and addresses

Cardiff University

Procurement Services, McKenzie House, 30-36 Newport Road

Cardiff

CF24 0DE

UK

Telephone: +44 2920879648

E-mail: buyline@cardiff.ac.uk

NUTS: UKL22

Internet address(es)

Main address: www.cardiff.ac.uk/purch/

Address of the buyer profile: http://www.sell2wales.gov.wales/search/Search_AuthProfile.aspx?ID=AA0258

I.4) Type of the contracting authority

Body governed by public law

I.5) Main activity

Education

Section II: Object

II.1) Scope of the procurement

II.1.1) Title

ICP ETCH

Reference number: SPEC511

II.1.2) Main CPV code

22520000

 

II.1.3) Type of contract

Supplies

II.1.4) Short description

The Inductively Coupled Plasma Reactive Ion Etch machine is a specialist semiconductor cleanroom processing tool for dry etching of samples of semiconductor, polymer or metal in a high -vacuum chamber using gas. High purity reactive gas plasmas, are generated in the vacuum chamber which react with the material on the surface of the sample to etch it away.

II.1.6) Information about lots

This contract is divided into lots: No

II.1.7) Total value of the procurement

Value excluding VAT: 370 000.00  GBP

II.2) Description

II.2.3) Place of performance

NUTS code:

UKL22

II.2.4) Description of the procurement

The Inductively Coupled Plasma Reactive Ion Etch machine is a specialist semiconductor cleanroom processing tool for dry etching of samples of semiconductor, polymer or metal in a high -vacuum chamber using gas. High purity reactive gas plasmas, are generated in the vacuum chamber which react with the material on the surface of the sample to etch it away.

II.2.5) Award criteria

Quality criterion: Quality / Weighting: 70

Price / Weighting:  30

II.2.11) Information about options

Options: Yes

Description of options:

See tender documents

II.2.13) Information about European Union funds

The procurement is related to a project and/or programme financed by European Union funds: No

Section IV: Procedure

IV.1) Description

IV.1.1) Type of procedure

Open procedure

IV.1.8) Information about Government Procurement Agreement (GPA)

The procurement is covered by the Government Procurement Agreement: Yes

IV.2) Administrative information

IV.2.1) Previous publication concerning this procedure

Notice number in the OJ S:

2016/S 164-295095

Section V: Award of contract

A contract/lot is awarded: Yes

V.2 Award of contract

V.2.1) Date of conclusion of the contract

02/12/2016

V.2.2) Information about tenders

Number of tenders received: 3

The contract has been awarded to a group of economic operators: No

V.2.3) Name and address of the contractor

Oxford Instruments Nanotechnology Tools Limited

Tubney Woods

Abingdon

OX13 5QX

UK

Telephone: +44 1865393805

NUTS: UK

The contractor is an SME: No

V.2.4) Information on value of the contract/lot (excluding VAT)

Total value of the contract/lot: : 370 000.00  GBP

V.2.5) Information about subcontracting

Section VI: Complementary information

VI.3) Additional information

(WA Ref:58613)

VI.4) Procedures for review

VI.4.1) Review body

Cardiff University

Procurement Services, McKenzie House, 30-36 Newport Road

Cardiff

CF24 0DE

UK

Telephone: +44 2920879648

Internet address(es)

URL: www.cardiff.ac.uk/purch/

VI.5) Date of dispatch of this notice

02/12/2016

Coding

Commodity categories

ID Title Parent category
22520000 Dry-etching equipment Printing plates or cylinders or other media for use in printing

Delivery locations

ID Description
1022 Cardiff and Vale of Glamorgan

Alert region restrictions

The buyer has restricted the alert for this notice to suppliers based in the following regions.

ID Description
There are no alert restrictions for this notice.

Document family

Notice details
Publication date:
25 August 2016
Deadline date:
22 September 2016 00:00
Notice type:
02 Contract Notice
Authority name:
Cardiff University
Publication date:
05 December 2016
Notice type:
03 Contract Award Notice - Successful Supplier(s)
Authority name:
Cardiff University

About the buyer

Main contact:
buyline@cardiff.ac.uk
Admin contact:
N/a
Technical contact:
N/a
Other contact:
N/a

Further information

Date Details
No further information has been uploaded.

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